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Optimization of electron beam dose for reliable nanoscale growth template formation in electron beam lithography system
Published in Institute of Electrical and Electronics Engineers Inc.
Pages: 1 - 4
Dose optimization of electron beam has been performed for transferring nano-dimension patterns by employing electron beam lithography. An extensive study has been conducted for optimizing lithographic features with e-beam resist PMMA of different thicknesses. It has been possible to obtain sub-80 nm circular dot patterns with good resolution and high aspect ratio. Au template has been developed by employing lift-off technique for subsequent nanostructure growth employing VLS method. TiO2 nanoislands have been grown on patterned Au template and its crystallographic nature has been studied by using X-ray diffraction measurement. The grown nanoislands showed perfect hexagonal facets. © 2018 IEEE.
About the journal
JournalData powered by Typeset2018 International Symposium on Devices, Circuits and Systems, ISDCS 2018
PublisherData powered by TypesetInstitute of Electrical and Electronics Engineers Inc.
Open AccessNo