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Nanostructured ZnTe films prepared by D.C. magnetron sputtering
, D. Bhattacharyya, A.B. Maity, S. Chaudhuri, A.K. Pal
Published in
Volume: 4
Issue: 3
Pages: 329 - 336
ZnTe films in nanostructured form have been deposited by high pressure d.c. magnetron sputtering of a ZnTe target onto different substrates kept at various temperatures ranging from 223-373 K. Shift of the band gap to higher energies depended on the relative magnitudes of substrate temperature and gas pressure during deposition. © 1994.
About the journal
JournalNanostructured Materials